Cita APA (7a ed.)
Chen, Y., & Sappington, D. E. M. (Summer2018). An optimal rule for patent damages under sequential innovation. RAND Journal of Economics (Wiley-Blackwell), 49(2), 370-398.
Cita Chicago Style (17a ed.)
Chen, Yongmin, y David E. M. Sappington. "An Optimal Rule for Patent Damages Under Sequential Innovation." RAND Journal of Economics (Wiley-Blackwell) 49, no. 2 (Summer2018): 370-398.
Cita MLA (9a ed.)
Chen, Yongmin, y David E. M. Sappington. "An Optimal Rule for Patent Damages Under Sequential Innovation." RAND Journal of Economics (Wiley-Blackwell), vol. 49, no. 2, Summer2018, pp. 370-398.
Precaución: Estas citas no son 100% exactas.