APA (7th ed.) Citation
Deeb, C., Ecoffet, C., Bachelot, R., Plain, J., Bouhelier, A., & Soppera, O. (2011). Plasmon-Based Free-Radical Photopolymerization: Effect of Diffusion on Nanolithography Processes. Journal of the American Chemical Society, 133(27), 10535-10543.
Chicago Style (17th ed.) Citation
Deeb, Claire, Carole Ecoffet, Renaud Bachelot, Jérôme Plain, Alexandre Bouhelier, and Olivier Soppera. "Plasmon-Based Free-Radical Photopolymerization: Effect of Diffusion on Nanolithography Processes." Journal of the American Chemical Society 133, no. 27 (2011): 10535-10543.
MLA (9th ed.) Citation
Deeb, Claire, et al. "Plasmon-Based Free-Radical Photopolymerization: Effect of Diffusion on Nanolithography Processes." Journal of the American Chemical Society, vol. 133, no. 27, 2011, pp. 10535-10543.
Warning: These citations may not always be 100% accurate.