Electrochemical Deposition of CoCu/Cu Multilayers: Structural and Magnetic Properties as a Function of Non-magnetic Layer Thickness.
Electrochemical deposition of CoCu/Cu multilayers was performed on titanium substrates from a single bath as a function of the Cu layer thicknesses. The deposition potentials were selected as −1.5 V for the magnetic layers and −0.3 V for the non-magnetic layers with respect to the saturated calomel...
| Publicado en: | Zeitschrift für Naturforschung Section A: A Journal of Physical Sciences Vol. 73; no. 2; pp. 127 - 134 |
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| Autores principales: | , , , |
| Formato: | Artículo |
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De Gruyter
Feb2018
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| Materias: | |
| Acceso en línea: | Ver este registro en EBSCOhost |
| fields | @attributes: recordID: 1 pdfLink: plink: https://search.ebscohost.com/login.aspx?direct=true&db=hlh&AN=127866850&site=ehost-live header: @attributes: shortDbName: hlh uiTerm: 127866850 longDbName: Humanities International Complete uiTag: AN controlInfo: bkinfo: jinfo: jid: 09320784 FL07 jtl: Zeitschrift für Naturforschung Section A: A Journal of Physical Sciences issn: 09320784 maglogo: N pubinfo: dt: Feb2018 vid: 73 iid: 2 pid: 1734 pub: De Gruyter artinfo: ui: 127866850 10.1515/zna-2017-0332 ppf: 127 ppct: 7 formats: tig: atl: Electrochemical Deposition of CoCu/Cu Multilayers: Structural and Magnetic Properties as a Function of Non-magnetic Layer Thickness. aug: au: Tekgül, Atakan Kockar, Hakan Kuru, Hilal Alper, Mursel affil: Uludag University, Physics Department, Science and Literature Faculty, TR-16059 Bursa, Turkey Balikesir University, Physics Department, Science and Literature Faculty, TR-10145 Balikesir, Turkey su: Cobalt Copper Multilayers Magnetoresistance Polycrystals sug: subj: Cobalt Copper Multilayers Magnetoresistance Polycrystals ab: Electrochemical deposition of CoCu/Cu multilayers was performed on titanium substrates from a single bath as a function of the Cu layer thicknesses. The deposition potentials were selected as −1.5 V for the magnetic layers and −0.3 V for the non-magnetic layers with respect to the saturated calomel electrode. The current-time transients were obtained during the deposition process, and the Co layer deposition and capacitive transients were calculated. On the basis of structural analysis, the multilayers were found to be polycrystalline with both Co and Cu layers adopting the face-centered cubic structure. The calculated lattice parameters of the multilayers slightly increase from 0.3585 to 0.3615 nm with increase in the Cu layer thickness, which is consistent with the bulk value of Cu. The inter-planar distance of the peaks of the multilayers is closer to that of Cu (<italic>d</italic>=0.2087 nm) and Co (<italic>d</italic>=0.2046 nm), and they become close to that of bulk Cu with increasing Cu layer thickness. In magnetic measurements, the magnetization decreases from 156 to 44 emu/cm depending on the Cu layer thickness. Furthermore, the coercivity of the multilayers increases from 20 to 140 Oe. These values show that the magnetic behaviour of the multilayers lie between those of soft and hard magnetic materials, but the multilayer having 2.5 nm Cu layer thickness shows hard magnetic property. For the CoCu(4 nm)/Cu(0.7 nm) multilayer, the magnetoresistance measurement shows 5.5 % giant magnetoresistance (GMR). pubtype: Academic Journal doctype: Article src: R language: English refInfo: copyright: @attributes: flag: Y dt: @attributes: year: 2018 holdings: @attributes: islocal: N |
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