Electrochemical Deposition of CoCu/Cu Multilayers: Structural and Magnetic Properties as a Function of Non-magnetic Layer Thickness.

Electrochemical deposition of CoCu/Cu multilayers was performed on titanium substrates from a single bath as a function of the Cu layer thicknesses. The deposition potentials were selected as −1.5 V for the magnetic layers and −0.3 V for the non-magnetic layers with respect to the saturated calomel...

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Publicado en:Zeitschrift für Naturforschung Section A: A Journal of Physical Sciences Vol. 73; no. 2; pp. 127 - 134
Autores principales: Tekgül, Atakan, Kockar, Hakan, Kuru, Hilal, Alper, Mursel
Formato: Artículo
Publicado: De Gruyter Feb2018
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Acceso en línea:Ver este registro en EBSCOhost
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      dt: Feb2018
      vid: 73
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      pub: De Gruyter
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        127866850
        10.1515/zna-2017-0332
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        atl: Electrochemical Deposition of CoCu/Cu Multilayers: Structural and Magnetic Properties as a Function of Non-magnetic Layer Thickness.
      aug:
        au:
          Tekgül, Atakan
          Kockar, Hakan
          Kuru, Hilal
          Alper, Mursel
        affil:
          Uludag University, Physics Department, Science and Literature Faculty, TR-16059 Bursa, Turkey
          Balikesir University, Physics Department, Science and Literature Faculty, TR-10145 Balikesir, Turkey
      su:
        Cobalt
        Copper
        Multilayers
        Magnetoresistance
        Polycrystals
      sug:
        subj:
          Cobalt
          Copper
          Multilayers
          Magnetoresistance
          Polycrystals
      ab: Electrochemical deposition of CoCu/Cu multilayers was performed on titanium substrates from a single bath as a function of the Cu layer thicknesses. The deposition potentials were selected as −1.5 V for the magnetic layers and −0.3 V for the non-magnetic layers with respect to the saturated calomel electrode. The current-time transients were obtained during the deposition process, and the Co layer deposition and capacitive transients were calculated. On the basis of structural analysis, the multilayers were found to be polycrystalline with both Co and Cu layers adopting the face-centered cubic structure. The calculated lattice parameters of the multilayers slightly increase from 0.3585 to 0.3615 nm with increase in the Cu layer thickness, which is consistent with the bulk value of Cu. The inter-planar distance of the peaks of the multilayers is closer to that of Cu (<italic>d</italic>=0.2087 nm) and Co (<italic>d</italic>=0.2046 nm), and they become close to that of bulk Cu with increasing Cu layer thickness. In magnetic measurements, the magnetization decreases from 156 to 44 emu/cm depending on the Cu layer thickness. Furthermore, the coercivity of the multilayers increases from 20 to 140 Oe. These values show that the magnetic behaviour of the multilayers lie between those of soft and hard magnetic materials, but the multilayer having 2.5 nm Cu layer thickness shows hard magnetic property. For the CoCu(4 nm)/Cu(0.7 nm) multilayer, the magnetoresistance measurement shows 5.5 % giant magnetoresistance (GMR).
      pubtype: Academic Journal
      doctype: Article
      src: R
    language: English
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          year: 2018
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