Homogeneous Decomposition of Aryl- and Alkylimido Precursors for the Chemical Vapor Deposition of Tungsten Nitride: A Combined Density Functional Theory and Experimental Study.

MOCVD growth of tungsten nitride (WN) and tungsten carbonitride (WNC) thin films has been reported from the complexes CI(CHCN)W(NR) (1: R = Ph; 2: R = Pr; 3: R = CH). To evaluate the role of the imido substituent in film growth, gas-phase homogeneous decomposition of precursor molecules was investig...

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Publicado en:	Journal of the American Chemical Society Vol. 128; no. 42; pp. 13781 - 13789
Autores principales:	Yong Sun Won, Young Seok Kim, Anderson, Timothy J., Reitfort, Laurel L., Ghiviriga, Ion, McElwee-White, Lisa
Formato:	Artículo
Publicado:	American Chemical Society 10/25/2006
Materias:	Nitrides Tungsten Transition metal nitrides Thin films Density functionals Chemical decomposition
Acceso en línea:	Ver este registro en EBSCOhost