Strain-Engineered MOSFETs

Currently strain engineering is the main technique used to enhance the performance of advanced silicon-based metal-oxide-semiconductor field-effect transistors (MOSFETs). Written from an engineering application standpoint, Strain-Engineered MOSFETs introduces promising strain techniques to fabricate...

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Detalles Bibliográficos

Autores principales:	C.K. Maiti, T.K. Maiti
Formato:	Libro
Publicado:	CRC Press 2013
Materias:	Metal oxide semiconductor field-effect transistors > Reliability Integrated circuits > Fault tolerance Strains and stresses
Acceso en línea:	Ver este registro en EBSCOhost