Ligand Field Effect at Oxide—Metal Interface on the Chemical Reactivity of Ultrathin Oxide Film Surface.

Ultrathin oxide film is currently one of the paramount candidates for a heterogeneous catalyst because it provides an additional dimension, i.e., film thickness, to control chemical reactivity. Here, we demonstrate that the chemical reactivity of ultrathin MgO film grown on Ag(100) substrate for the...

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Bibliographic Details
Published in:Journal of the American Chemical Society Vol. 134; no. 25; pp. 10554 - 10562
Main Authors: Jaehoon Jung, Hyung-Joon Shin, Yousoo Kim, Maki Kawai
Format: Article
Published: American Chemical Society 6/27/2012
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Online Access:View this record in EBSCOhost
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Summary:Ultrathin oxide film is currently one of the paramount candidates for a heterogeneous catalyst because it provides an additional dimension, i.e., film thickness, to control chemical reactivity. Here, we demonstrate that the chemical reactivity of ultrathin MgO film grown on Ag(100) substrate for the dissociation of individual water molecules can be systematically controlled by interface dopants over the film thickness. Density functional theory calculations revealed that adhesion at the oxide-metal interface can be addressed by the ligand field effect and is linearly correlated with the chemical reactivity of the oxide film. In addition, our results indicate that the concentration of dopant at the interface can be controlled by tuning the drawing effect of oxide film. Our study provides not only profound insight into chemical reactivity control of ultrathin oxide film supported by a metal substrate but also an impetus for investigating ultrathin oxide films for a wider range of applications.