Prediction of Silicon-Based Layered Structures for Optoelectronic Applications.

A method based on the particle swarm optimization algorithm is presented to design quasi-two-dimensional materials. With this development, various single-layer and bilayer materials of C, Si, Ge, Sn, and Pb were predicted. A new Si bilayer structure is found to have a more favored energy than the pr...

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Publicado en:Journal of the American Chemical Society Vol. 136; no. 45; pp. 15992 - 15998
Autores principales: Wei Luo, Xingao Gong, Hongjun Xiang, Yanming Ma
Formato: Artículo
Publicado: American Chemical Society 11/12/2014
Materias:
Acceso en línea:Ver este registro en EBSCOhost
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      dt: 11/12/2014
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        10.1021/ja507147p
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        atl: Prediction of Silicon-Based Layered Structures for Optoelectronic Applications.
      aug:
        au:
          Wei Luo
          Xingao Gong
          Hongjun Xiang
          Yanming Ma
        affil:
          Key Laboratory of Computational Physical Sciences (Ministry of Education), State Key Laboratory of Surface Physics, and Department of Physics, Fudan University, Shanghai 200433, P. R. China
          Collaborative Innovation Center of Advanced Microstructures, Fudan University, Shanghai 200433, P. R. China
          Department of Cell Biology, New York University Medical Center, New York, New York, U.S.A
      su:
        Optoelectronics
        Silicon
        Hydrogenation
        Particle swarm optimization
        Light emitting diodes
        Photovoltaic power generation
        Density functional theory
      sug:
        subj:
          Optoelectronics
          Silicon
          Hydrogenation
          Particle swarm optimization
          Light emitting diodes
          Photovoltaic power generation
          Density functional theory
      ab: A method based on the particle swarm optimization algorithm is presented to design quasi-two-dimensional materials. With this development, various single-layer and bilayer materials of C, Si, Ge, Sn, and Pb were predicted. A new Si bilayer structure is found to have a more favored energy than the previously widely accepted configuration. Both single-layer and bilayer Si materials have small band gaps, limiting their usages in optoelectronic applications. Hydrogénation has therefore been used to tune the electronic and optical properties of Si layers. We discover two hydrogenated materials of layered SiH and SiH possessing quasidirect band gaps of 0.75 and 1.59 eV, respectively. Their potential applications for light-emitting diode and photovoltaics are proposed and discussed. Our study opened up the possibility of hydrogenated Si layered materials as next-generation optoelectronic devices.
      pubtype: Academic Journal
      doctype: Article
      src: R
    language: English
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