Regioselective Atomic Layer Deposition in Metal-Organic Frameworks Directed by Dispersion Interactions.
The application of atomic layer deposition (ALD) to metal-organic frameworks (MOFs) offers a promising new approach to synthesize designer functional materials with atomic precision. While ALD on flat substrates is well established, the complexity of the pore architecture and surface chemistry in MO...
| Publicado en: | Journal of the American Chemical Society Vol. 138; no. 41; pp. 1351313513 - 1351313517 |
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| Autores principales: | , , , , , , , , , , , |
| Formato: | Artículo |
| Publicado: |
American Chemical Society
10/19/2016
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| Materias: | |
| Acceso en línea: | Ver este registro en EBSCOhost |
| fields | @attributes: recordID: 1 pdfLink: plink: https://search.ebscohost.com/login.aspx?direct=true&db=hlh&AN=119357004&site=ehost-live header: @attributes: shortDbName: hlh uiTerm: 119357004 longDbName: Humanities International Complete uiTag: AN controlInfo: bkinfo: jinfo: jid: 00027863 ACS jtl: Journal of the American Chemical Society issn: 00027863 maglogo: N pubinfo: dt: 10/19/2016 vid: 138 iid: 41 pid: 997 pub: American Chemical Society artinfo: ui: 119357004 10.1021/jacs.6b08711 ppf: 1351313513 ppct: 4 formats: tig: atl: Regioselective Atomic Layer Deposition in Metal-Organic Frameworks Directed by Dispersion Interactions. aug: au: Gallington, Leighanne C. In Soo Kim Wei-Guang Liu Yakovenko, Andrey A. Platero-Prats, Ana E. Zhanyong Li Wang, Timothy C. Hupp, Joseph T. Farha, Omar K. Truhlar, Donald G. Martinson, Alex B. F. Chapman, Karena W. affil: X-ray Science Division, Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439-4858, United States Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439, United States Department of Chemistry, Chemical Theory Center, and Supercomputing Institute, University of Minnesota, Minneapolis, Minnesota 55455-0431, United States Department of Chemistry, Northwestern University, Evanston, Illinois 60208-3113, United States Department of Chemistry, Faculty of Science, King Abdulaziz University, Jeddah 21589, Saudi Arabia su: Surface chemistry Density functionals Atomic layer deposition X-ray powder diffraction Metal-organic frameworks Chemical vapor deposition Physical & theoretical chemistry sug: subj: Surface chemistry Density functionals Atomic layer deposition X-ray powder diffraction Metal-organic frameworks Chemical vapor deposition Physical & theoretical chemistry ab: The application of atomic layer deposition (ALD) to metal-organic frameworks (MOFs) offers a promising new approach to synthesize designer functional materials with atomic precision. While ALD on flat substrates is well established, the complexity of the pore architecture and surface chemistry in MOFs present new challenges. Through in situ synchrotron X-ray powder diffraction, we visualize how the deposited atoms are localized and redistribute within the MOF during ALD. We demonstrate that the ALD is regioselective, with preferential deposition of oxy-Zn(II) species within the small pores of NU-1000. Complementary density functional calculations indicate that this startling regioselectivity is driven by dispersion interactions associated with the preferential adsorption sites for the organometallic precursors prior to reaction. pubtype: Academic Journal doctype: Article src: R language: English refInfo: copyright: @attributes: flag: Y dt: @attributes: year: 2016 holdings: @attributes: islocal: N |
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