Regioselective Atomic Layer Deposition in Metal-Organic Frameworks Directed by Dispersion Interactions.

The application of atomic layer deposition (ALD) to metal-organic frameworks (MOFs) offers a promising new approach to synthesize designer functional materials with atomic precision. While ALD on flat substrates is well established, the complexity of the pore architecture and surface chemistry in MO...

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Publicado en:	Journal of the American Chemical Society Vol. 138; no. 41; pp. 1351313513 - 1351313517
Autores principales:	Gallington, Leighanne C., In Soo Kim, Wei-Guang Liu, Yakovenko, Andrey A., Platero-Prats, Ana E., Zhanyong Li, Wang, Timothy C., Hupp, Joseph T., Farha, Omar K., Truhlar, Donald G., Martinson, Alex B. F., Chapman, Karena W.
Formato:	Artículo
Publicado:	American Chemical Society 10/19/2016
Materias:	Surface chemistry Density functionals Atomic layer deposition X-ray powder diffraction Metal-organic frameworks Chemical vapor deposition Physical & theoretical chemistry
Acceso en línea:	Ver este registro en EBSCOhost