Investigation of the effect of Si content on the structural, mechanical, and tribological properties of TiAlN/AlSi protective multilayers.

Titanium aluminum nitride and aluminum silicon alloys (TiAlN/AlSi) or for simplicity (TAN/AS) bilayer system were deposited on glass and piston aluminum substrates by following three steps. First, AlSi films realized by thermal evaporation with different Si content (7, 10, 13, 22) %. Then, TiAl film...

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Published in:Zeitschrift für Naturforschung Section A: A Journal of Physical Sciences Vol. 80; no. 3; pp. 247 - 259
Main Authors: Lekoui, Fouaz, Amrani, Rachid, Henni, Laid, Filali, Walid, Garoudja, Elyes, Ouchabane, Mohammed, Oussalah, Slimane, Hassani, Salim
Format: Article
Published: De Gruyter Mar2025
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      dt: Mar2025
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        10.1515/zna-2024-0235
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        atl: Investigation of the effect of Si content on the structural, mechanical, and tribological properties of TiAlN/AlSi protective multilayers.
      aug:
        au:
          Lekoui, Fouaz
          Amrani, Rachid
          Henni, Laid
          Filali, Walid
          Garoudja, Elyes
          Ouchabane, Mohammed
          Oussalah, Slimane
          Hassani, Salim
        affil:
          Division Milieux Ionisés & Laser, Centre de Développement des Technologies Avancées, Cité 20 Août, 1956, Baba Hassen, Alger, Algeria
          Département des Sciences de la Matière, Université Alger1 Benyoucef Benkhedda, Alger, Algeria
          LPCMME, Département de physique, Université d'Oran 1, Oran, Algeria
          Plateforme Technologique de Micro-Fabrication, Centre de Développement des Technologies Avancées, Cité 20 Août 1956, Baba Hassen, Alger, Algeria
          Division Microélectronique & Nanotechnologies, Centre de Développement des Technologies Avancées, Cité 20 Août 1956, Baba Hassen, Alger, Algeria
      su:
        Silicon alloys
        DC sputtering
        Aluminum nitride
        Titanium nitride
        Atomic force microscopy
      sug:
        subj:
          Silicon alloys
          DC sputtering
          Aluminum nitride
          Titanium nitride
          Atomic force microscopy
      keyword:
        DC magnetron sputtering
        Direct Current Plasma Nitriding (DCPN)
        friction coefficient
        hardness
        TiAlN/AlSi multilayers coatings
      ab: Titanium aluminum nitride and aluminum silicon alloys (TiAlN/AlSi) or for simplicity (TAN/AS) bilayer system were deposited on glass and piston aluminum substrates by following three steps. First, AlSi films realized by thermal evaporation with different Si content (7, 10, 13, 22) %. Then, TiAl films were deposited on AlSi layers using a reactive DC magnetron sputtering system, and finally the realization of TAN/AS multilayers were done by nitriding via Direct Current Plasma Nitriding (DCPN) in a custom setup, with pure nitrogen gas. For each sample, the structural properties like phase's formation and vibration modes were investigated by X-ray diffraction and Raman spectroscopy, while AFM microscopy investigated surface topography. The mechanical and tribological properties in terms of hardness and friction coefficient were determined using the nanoindentation technique and tribometer. It has been found that all the coatings TAN/AS have crystalline structures with the presence of TiAlN, TiN, AlN, TiAl, and α-Al phases. Raman spectroscopy reveals the appearance of TO/LO, 2O, and 2TO/LO modes for all layers. AFM images show that the coatings have low roughness, Ra values decrease from 17.3 nm for 7 % Si to 5.5 nm for 13 % Si and increases to 9.9 nm at 22 % Si. The grain size exhibits a reversed behavior compared to that of roughness. The hardness and Young modulus reach their optimum values at 13 % Si with no respect to Hall–Petch law. The friction coefficient of TAN/AS coatings decreases with Si content and reaches its lowest value (<0.1) at 22 % Si as a potential protective layer.
      pubtype: Academic Journal
      doctype: Article
      src: R
    language: English
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          year: 2025
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