Light Stamping Lithography: Microcontact Printing without Inks.
We report a new patterning method, called light-stamping lithography (LSL), that uses UV-induced adhesion of poly(dimethylsiloxane) (PDMS). LSL is based on the direct transfer of the contact surface of the PDMS stamp to a substrate via a UV (254 nm)-induced surface bonding between the stamp and the...
| Publicado en: | Journal of the American Chemical Society Vol. 128; no. 3; pp. 858 - 866 |
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| Autores principales: | , , , , |
| Formato: | Artículo |
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American Chemical Society
1/25/2006
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| Acceso en línea: | Ver este registro en EBSCOhost |
| fields | @attributes: recordID: 1 pdfLink: plink: https://search.ebscohost.com/login.aspx?direct=true&db=hlh&AN=20217822&site=ehost-live header: @attributes: shortDbName: hlh uiTerm: 20217822 longDbName: Humanities International Complete uiTag: AN controlInfo: bkinfo: jinfo: jid: 00027863 ACS jtl: Journal of the American Chemical Society issn: 00027863 maglogo: N pubinfo: dt: 1/25/2006 vid: 128 iid: 3 pid: 997 pub: American Chemical Society artinfo: ui: 20217822 10.1021/ja055377p ppf: 858 ppct: 8 formats: tig: atl: Light Stamping Lithography: Microcontact Printing without Inks. aug: au: Park, Kyung S. Seo, Eun K. Do, Young R. Kim, Kwan Sung, Myung M. affil: Contribution from the Department of Chemistry, Kookmin University, Chongnung-dong, Songbuk-ku, Seoul 136-702, Korea Department of Chemistry, Seoul National University, Shilim-dong, Kwanak-gu, Seoul, 151-742 Korea su: Lithography Thin films Ultraviolet radiation Computer printers Surface chemistry Biochemistry sug: subj: Lithography Thin films Ultraviolet radiation Computer printers Surface chemistry Biochemistry ab: We report a new patterning method, called light-stamping lithography (LSL), that uses UV-induced adhesion of poly(dimethylsiloxane) (PDMS). LSL is based on the direct transfer of the contact surface of the PDMS stamp to a substrate via a UV (254 nm)-induced surface bonding between the stamp and the substrate. This procedure can be adopted in automated printing machines that generate patterns with a wide range of feature sizes on diverse substrates. To demonstrate its usefulness, the LSL method was applied to prepare several PDMS patterns on a variety of substrates. The PDMS patterns were then used as templates for selective deposition of TiO thin film using atomic layer deposition as well as resists for selective wet etching. pubtype: Academic Journal doctype: Article src: R language: English refInfo: copyright: @attributes: flag: Y dt: @attributes: year: 2006 holdings: @attributes: islocal: N |
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