New Technique Could Increase Chip Performance.
The article discusses a lithography technique under development at the Massachusetts Institute of Technology (MIT) that holds promise for creating grids of parallel lines on computer chips that are only 25 nanometers wide. Scanning-beam interference lithography (SBIL), developed by researchers under...
| Publicado en: | Computer (00189162) Vol. 42; no. 3; pp. 21 - 23 |
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| Formato: | Artículo |
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IEEE
Mar2009
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| Acceso en línea: | Ver este registro en EBSCOhost |