Multilevel Microfluidics via Single-Exposure Photolithography.
The article demonstrates a new technique that can be used to form multilevel features in SU-8 photoresist using a single lithography step, thereby minimizing or eliminating multi step protocols and alignment issues. The method utilizes the spatial dependence of diffracted light intensity to selectiv...
| Publicado en: | Journal of the American Chemical Society Vol. 127; no. 21; pp. 7674 - 7676 |
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| Autores principales: | , |
| Formato: | Artículo |
| Publicado: |
American Chemical Society
6/1/2005
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| Materias: | |
| Acceso en línea: | Ver este registro en EBSCOhost |
| Sumario: | The article demonstrates a new technique that can be used to form multilevel features in SU-8 photoresist using a single lithography step, thereby minimizing or eliminating multi step protocols and alignment issues. The method utilizes the spatial dependence of diffracted light intensity to selectively overexpose certain masked regions of photoresist. The technique requires only a collimated UV light source and allows for a range of feature heights to be integrated simultaneously within a channel structure. Multilevel features have previously been used to enhance the performance and/or increase the capabilities of a variety of microfluidic devices. |
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