Multilevel Microfluidics via Single-Exposure Photolithography.

The article demonstrates a new technique that can be used to form multilevel features in SU-8 photoresist using a single lithography step, thereby minimizing or eliminating multi step protocols and alignment issues. The method utilizes the spatial dependence of diffracted light intensity to selectiv...

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Detalles Bibliográficos

Publicado en:	Journal of the American Chemical Society Vol. 127; no. 21; pp. 7674 - 7676
Autores principales:	Toepke, Michael W., Kenis, Paul J. A.
Formato:	Artículo
Publicado:	American Chemical Society 6/1/2005
Materias:	Photoresists Lithography Optical diffraction Light Ultraviolet radiation Microfluidics
Acceso en línea:	Ver este registro en EBSCOhost