Multilevel Microfluidics via Single-Exposure Photolithography.
The article demonstrates a new technique that can be used to form multilevel features in SU-8 photoresist using a single lithography step, thereby minimizing or eliminating multi step protocols and alignment issues. The method utilizes the spatial dependence of diffracted light intensity to selectiv...
| Publicado en: | Journal of the American Chemical Society Vol. 127; no. 21; pp. 7674 - 7676 |
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| Autores principales: | , |
| Formato: | Artículo |
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American Chemical Society
6/1/2005
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| Acceso en línea: | Ver este registro en EBSCOhost |
| fields | @attributes: recordID: 1 pdfLink: plink: https://search.ebscohost.com/login.aspx?direct=true&db=hlh&AN=17253676&site=ehost-live header: @attributes: shortDbName: hlh uiTerm: 17253676 longDbName: Humanities International Complete uiTag: AN controlInfo: bkinfo: jinfo: jid: 00027863 ACS jtl: Journal of the American Chemical Society issn: 00027863 maglogo: N pubinfo: dt: 6/1/2005 vid: 127 iid: 21 pid: 997 pub: American Chemical Society artinfo: ui: 17253676 10.1021/ja050660+ ppf: 7674 ppct: 2 formats: tig: atl: Multilevel Microfluidics via Single-Exposure Photolithography. aug: au: Toepke, Michael W. Kenis, Paul J. A. affil: Department of Chemical & Biomolecular Engineering, University of Illinois at Urbana-Champaign, 600 South Mathews Avenue, Urbana, Illinois 61801 su: Photoresists Lithography Optical diffraction Light Ultraviolet radiation Microfluidics sug: subj: Photoresists Lithography Optical diffraction Light Ultraviolet radiation Microfluidics ab: The article demonstrates a new technique that can be used to form multilevel features in SU-8 photoresist using a single lithography step, thereby minimizing or eliminating multi step protocols and alignment issues. The method utilizes the spatial dependence of diffracted light intensity to selectively overexpose certain masked regions of photoresist. The technique requires only a collimated UV light source and allows for a range of feature heights to be integrated simultaneously within a channel structure. Multilevel features have previously been used to enhance the performance and/or increase the capabilities of a variety of microfluidic devices. pubtype: Academic Journal doctype: Article src: R language: English refInfo: copyright: @attributes: flag: Y dt: @attributes: year: 2005 holdings: @attributes: islocal: N |
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