X-ray Diffraction Area Mapping of Preferred Orientation and Phase Change in TiO Thin Films Deposited by Chemical Vapor Deposition.
This paper reports on an investigation into the formation of TiO thin films, whereby X-ray diffraction is used to map systematic changes in preferred orientation and phase observed throughout the films. The key to this strategy is the recording of X-ray diffraction patterns of specific and isolated...
| Published in: | Journal of the American Chemical Society Vol. 128; no. 37; pp. 12147 - 12156 |
|---|---|
| Main Authors: | , , |
| Format: | Article |
| Published: |
American Chemical Society
9/20/2006
|
| Subjects: | |
| Online Access: | View this record in EBSCOhost |
| fields | @attributes: recordID: 1 pdfLink: plink: https://search.ebscohost.com/login.aspx?direct=true&db=hlh&AN=22447651&site=ehost-live header: @attributes: shortDbName: hlh uiTerm: 22447651 longDbName: Humanities International Complete uiTag: AN controlInfo: bkinfo: jinfo: jid: 00027863 ACS jtl: Journal of the American Chemical Society issn: 00027863 maglogo: N pubinfo: dt: 9/20/2006 vid: 128 iid: 37 pid: 997 pub: American Chemical Society artinfo: ui: 22447651 10.1021/ja062766q ppf: 12147 ppct: 9 formats: tig: atl: X-ray Diffraction Area Mapping of Preferred Orientation and Phase Change in TiO Thin Films Deposited by Chemical Vapor Deposition. aug: au: Hyett, Geoffrey Green, Mark Parkin, Ivan P. affil: Christopher Ingold Laboratories, University College London, 20 Gordon Street, London WC1H 0AJ, United Kingdom su: X-ray diffraction Titanium dioxide Thin films Vapor-plating Chemical vapor deposition Chemical reactions Chemistry sug: subj: X-ray diffraction Titanium dioxide Thin films Vapor-plating Chemical vapor deposition Chemical reactions Chemistry ab: This paper reports on an investigation into the formation of TiO thin films, whereby X-ray diffraction is used to map systematic changes in preferred orientation and phase observed throughout the films. The key to this strategy is the recording of X-ray diffraction patterns of specific and isolated areas of a substrate, ensuring this specificity by the use of a small X-ray sample illumination area (approximately 3–5 mm). A map of the variation in film composition can then be built up by recording such diffraction patterns at regular intervals over the whole substrate. Two titania films will be presented, grown using atmospheric pressure chemical vapor deposition, at 450 and 600 °C, from TiCl and ethyl-acetate precursors. The film grown at 450 °C showed a systematic change in preferred orientation, while the film grown at 600 °C was composed of a mixture of the rutile and anatase phases of TiO with the ratio of these phases altering with position on the substrate. The results of physical property measurements and electron microscopy carried out on the films are also reported, conducted at locations identified by the X-ray diffraction mapping procedure as having different compositions, and hence different physical responses. We found that the photocatalytic activity and hydrophobicity were dependent on the rutile:anatase ratio at any given location on the film. pubtype: Academic Journal doctype: Article src: R language: English refInfo: copyright: @attributes: flag: Y dt: @attributes: year: 2006 holdings: @attributes: islocal: N |
|---|