X-ray Diffraction Area Mapping of Preferred Orientation and Phase Change in TiO Thin Films Deposited by Chemical Vapor Deposition.

This paper reports on an investigation into the formation of TiO thin films, whereby X-ray diffraction is used to map systematic changes in preferred orientation and phase observed throughout the films. The key to this strategy is the recording of X-ray diffraction patterns of specific and isolated...

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Publicado en:	Journal of the American Chemical Society Vol. 128; no. 37; pp. 12147 - 12156
Autores principales:	Hyett, Geoffrey, Green, Mark, Parkin, Ivan P.
Formato:	Artículo
Publicado:	American Chemical Society 9/20/2006
Materias:	X-ray diffraction Titanium dioxide Thin films Vapor-plating Chemical vapor deposition Chemical reactions Chemistry
Acceso en línea:	Ver este registro en EBSCOhost