Plasmon-Based Free-Radical Photopolymerization: Effect of Diffusion on Nanolithography Processes.

This Article interrogates the mechanisms responsible for nanoscale photopolymerization induced by confined and enhanced electromagnetic fields. Surface plasmon dipolar resonance of individual Ag nanoparticles was used as an optical near-field source to locally trigger the reaction of a photopolymeri...

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Publicado en:	Journal of the American Chemical Society Vol. 133; no. 27; pp. 10535 - 10543
Autores principales:	Deeb, Claire, Ecoffet, Carole, Bachelot, Renaud, Plain, Jérôme, Bouhelier, Alexandre, Soppera, Olivier
Formato:	Artículo
Publicado:	American Chemical Society 7/13/2011
Materias:	Photopolymerization Nanochemistry Electromagnetic fields Surface plasmon resonance Nanoparticles
Acceso en línea:	Ver este registro en EBSCOhost