Plasmon-Based Free-Radical Photopolymerization: Effect of Diffusion on Nanolithography Processes.

This Article interrogates the mechanisms responsible for nanoscale photopolymerization induced by confined and enhanced electromagnetic fields. Surface plasmon dipolar resonance of individual Ag nanoparticles was used as an optical near-field source to locally trigger the reaction of a photopolymeri...

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Publicado en:Journal of the American Chemical Society Vol. 133; no. 27; pp. 10535 - 10543
Autores principales: Deeb, Claire, Ecoffet, Carole, Bachelot, Renaud, Plain, Jérôme, Bouhelier, Alexandre, Soppera, Olivier
Formato: Artículo
Publicado: American Chemical Society 7/13/2011
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Acceso en línea:Ver este registro en EBSCOhost
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        atl: Plasmon-Based Free-Radical Photopolymerization: Effect of Diffusion on Nanolithography Processes.
      aug:
        au:
          Deeb, Claire
          Ecoffet, Carole
          Bachelot, Renaud
          Plain, Jérôme
          Bouhelier, Alexandre
          Soppera, Olivier
        affil:
          Laboratoire de Nanotechnologie et d'Instrumentation Optique LNIO-ICD CNRS-UMR 6279, Université de Technologie de Troyes, Troyes, France
          Institut de Science des Matériaux de Mulhouse (IS2M-CNRS LCR 7228), Université de Haute-Alsace, Mulhouse, France
          Laboratoire Interdisciplinaire Carnot de Bourgogne CNRS-UMR 5209, Université de Bourgogne, Dijon, France
      su:
        Photopolymerization
        Nanochemistry
        Electromagnetic fields
        Surface plasmon resonance
        Nanoparticles
      sug:
        subj:
          Photopolymerization
          Nanochemistry
          Electromagnetic fields
          Surface plasmon resonance
          Nanoparticles
      ab: This Article interrogates the mechanisms responsible for nanoscale photopolymerization induced by confined and enhanced electromagnetic fields. Surface plasmon dipolar resonance of individual Ag nanoparticles was used as an optical near-field source to locally trigger the reaction of a photopolymerizable formulation. Laser excitation of the nanoparticles embedded in the formulation reproducibly generates polymer features with typical dimensions ranging from 2 nm to a few tens of nanometer. We have determined the physicochemical parameters and mechanisms controlling the spatial extent of the photopolymerization process. We found that the diffusion of the dye is the main process limiting the polymerization reaction, as opposed to what is observed at the microscale with an equivalent chemical system. This approach demonstrates that plasmon-based polymerization can achieve true nanometer scale resolution and also provides a unique opportunity to investigate photochemistry at this length scale.
      pubtype: Academic Journal
      doctype: Article
      src: R
    language: English
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